The Ultra High Vacuum Chamber (UHVC) (designed by PTB and TU Berlin, Germany) is based on a seven-axis motorized manipulator for positioning the sample and the detectors regarding the synchrotron beam direction.
The UHVC is equipped with two Silicon Drift Detectors (SDDs) and several GaAs and Si photodiodes of various thicknesses as X-ray monitoring detectors connected to a picoammeter. Two video cameras for inspecting a large (macro-camera) and small (micro-camera) field of view on the sample surface are available. The instruments and devices of the end-station are operated through a Tango-based command and data acquisition server coupled with a user-friendly Graphical User Interface.
The end-station offers a combination of different advanced analytical probes, including X-ray reflectivity (XRR), grazing incidence/emission X-ray fluorescence (GI/GE-XRF) measurements, Total reflection X-ray fluorescence (TXRF) and, thanks to the beamline monochromator, X-ray absorption spectrometry (XAS). The facility supports thereby a comprehensive characterization for different kinds of nanostructured and bulk materials.
Schematic
diagrams and a picture of the end-station are shown here
